NYU Shanghai Launches Master of Arts in IMA with NYU's Tisch School of Arts

  • Deadline:
    Nov. 15, 2019, 11:59 p.m.

PROGRAM DETAILS
NYU Shanghai and New York University’s Tisch School of the Arts have launched a low-residency year-long Master of Arts in Interactive Media Arts. In its inaugural year, the program will combine two semesters of online study with three required in-person residencies at NYU sites in Shanghai, New York, and Berlin.

The program’s unique structure is designed to give students a flexible option for graduate study, and will help provide a thorough understanding of computational media and technology in global contexts. Each year, the program will have three required residency locations, with residencies in Shanghai and New York over two summers, with a third residency location to be selected each year from NYU’s 11 global academic centers.

The new degree is a collaboration between the Interactive Media Arts Program (IMA) at NYU Shanghai and the Interactive Telecommunications Program (ITP) at NYU Tisch. The program is focused on the production, application and understanding of interactive media for creative expression and critical engagement.

APPLICATION DETAILS
Applications for Summer 2020 are now open! Please go to start your official application. Please visit our website, or if you have any issues accessing this initial online form, please try copying and pasting the link into your browser:
https://apply.tisch.nyu.edu/register/ima_low_res_app

*The deadline to apply is November 15, 2019.

APPLICATION INSTRUCTIONS
This program, like the ITP and IMA cultures from which it derives, is a creative, multidisciplinary environment in which diversity is valued and collaboration is encouraged. A background in art, design or computer programming is not required for acceptance into the program. We are looking for applicants from a diverse range of undergraduate educational and professional backgrounds who want a first-hand understanding of the production and implications of interactive media systems, from the devices and networks on which they run to the range of expressive possibilities which they afford. Demonstrating an interest in real-world challenges along with a desire to investigate current aesthetic, social, political and ethical issues is encouraged.

Acceptance into the program is competitive; enrollment is limited to applicants who show exceptional promise and are interested in collaboration and experimentation. Students must be able to commit to the full program of one summer session in Shanghai (5 weeks), one January session in Berlin (2 weeks), one summer session in New York City (5 weeks), and two online semesters in the Fall and Spring.

All applicants must apply online. To begin, please fill out the initial application form, which can be found HERE. After submitting this form, you will receive a link via email to sign into NYU Tisch’s application platform where you can continue your application. Please note, for those also considering applying to NYU Tisch’s ITP, you will not be permitted to apply to both the Low Res and ITP in the same application year.

The following will will be required to complete the application. More detailed information is provided as you step through the online application.

-Personal Statement (prompt available within the application)
-Video Response (prompt available within the application)
-Resume / CV
-Two letters of recommendations
-Official transcripts showing at least a bachelor’s degree
-English language test scores for non-native English language speakers
-Creative Portfolio (optional, but highly encouraged)

For additional information regarding admissions and the application process, please see the ADMISSIONS section on the FAQ page: https://itp.nyu.edu/lowres/faq/

You can also contact us directly at LowRes@itp.nyu.edu.